电子薄膜用高纯钴靶材
High-purity cobalt sputtering target used in electronic film
2015-04-30
YS/T 819-2012
电子薄膜用高纯铜溅射靶材
High-purity sputtering copper target used in electronic film
2012-11-07
YS/T 1025-2015
电子薄膜用高纯钨及钨合金溅射靶材
High-purity tungsten and tungsten alloy sputtering target used in electronic film
2015-04-30
GB/T 29658-2013
电子薄膜用高纯铝及铝合金溅射靶材
High-Purity sputtering aluminium and aluminium alloy target used in electronic film
2013-09-06
T/ZZB 0093-2016
集成电路用高纯钛溅射靶材
High-purity sputtering titanium target used in integrated circuit
2016-09-10
YS/T 935-2013
电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications