现行 SJ/T 11508-2015
集成电路用 正胶显影液 集成电路用 正胶显影液 Positive Photoresist developer for Integrated Circuit
发布日期:2015-04-30
实施日期:2015-10-01
分类信息
研制信息

归口单位: 全国半导体设备和材料标准化技术委员会

起草单位: 江阴润玛电子材料股份有限公司、 工业和信息化部电子工业标准化研究院

起草人: 戈士勇、 何珂、 王周霞

标准简介

本标准规定了集成电路用 正胶显影液的技术指标和检测方法

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最后更新时间 2025-09-02