YS/T 1025-2015
电子薄膜用高纯钨及钨合金溅射靶材
High-purity tungsten and tungsten alloy sputtering target used in electronic film
2015-04-30
YS/T 893-2013
电子薄膜用高纯钛溅射靶材
High purity sputtering titanium target used in electronic film
2013-10-17
T/ZZB 0093-2016
集成电路用高纯钛溅射靶材
High-purity sputtering titanium target used in integrated circuit
2016-09-10
YS/T 1235-2018
钼钛合金（MoTi）靶材
Molybdenum-titanium alloy target
2018-04-30
YS/T 936-2013
集成电路器件用镍钒合金靶材
Sputtering nickel vanadium alloy target used in integrated circuit device
2013-10-17
GB/T 29658-2013
电子薄膜用高纯铝及铝合金溅射靶材
High-Purity sputtering aluminium and aluminium alloy target used in electronic film
2013-09-06
GOST 19863.4-1991
Сплавы титановые. Методы определения вольфрама
钛合金 钨的测定方法
GB/T 4698.26-2024
海绵钛、钛及钛合金化学分析方法 第26部分：钽和钨含量的测定 电感耦合等离子体原子发射光谱法
Methods for chemical analysis of titanium sponge,titanium and titanium alloys—Part 26: Determination of tantalum and tungsten content—Inductively coupled plasma atomic emission spectrometry
2024-10-26
SN/T 3515-2013
钢铁及合金 硼、钛、锆、铌、锡、锑、钽、钨、铅的测定 电感耦合等离子体质谱法
Iron,steel and alloy-Determination of boron,titanium,zirconium,niobium,tin,antimony,tantalum,tungsten and lead-Inductively coupled plasma mass spectrometric
2013-03-01
GB/T 38513-2020
铌铪合金化学分析方法 铪、钛、锆、钨、钽等元素的测定 电感耦合等离子体原子发射光谱法
Methods for chemical analysis of niobium hafnium alloys—Determination of hafnium, titanium, zirconium, tungsten, tantalum contents—Inductively coupled plasma atomic emission spectrometry
2020-03-06
XB/T 617.5-2014
钕铁硼合金化学分析方法 第5部分：锆、铌、钼、钨和钛量的测定 电感耦合等离子体原子发射光谱法
Chemical analysis methods for neodymium iron boron alloy—Part 5:Determination of zirconium,niobium,molybdenum,tungsten and titanium contents—Inductively coupled plasma atomic emission spectrometry
2014-10-14
BS 2HC 208-1989
Specification for nickel-cobalt-tungsten-chromium-aluminium-molybdenum-titanium-tantalum alloy castings (nickel base Co 10.0, W 10.0, Cr 9.0, Al 5.5, Mo 2.5, Ti 1.5, Ta 1.5)
镍钴钨铬铝钼钛钽合金铸件规范（镍基钴10.0 钨10.0 铬9.0 铝5.5 钼2.5 钛1.5 钽1.5）
1989-10-31
BS 2HC 207-1989
Specification for nickel-cobalt-tungsten-chromium-aluminium-tantalum-hafnium-titanium alloy castings (Nickel base Co 10.0, W 10.0, Cr 9.0, Al 5.5, Ta 2.5, Hf 1.5, Ti 1.5)
镍钴钨铬铝钽铪钛合金铸件规范（镍基钴10.0 钨10.0 铬9.0 铝5.5 钽2.5 氟化氢1.5 钛1.5）
1989-10-31
GB/T 43603.2-2024
镍铂靶材合金化学分析方法 第2部分：镁、铝、钛、钒、铬、锰、铁、钴、铜、锌、锆、银、钯、锡、钐、铅、硅含量的测定 电感耦合等离子体质谱法
Methods for chemical analysis of nickel-platinum target alloys—Part 2：Determination of magnesium,aluminium,titanium,vanadium,chromium,manganese,iron,cobalt,coppe,zinc,zirconium,silver,palladium,tin,samarium,lead,silicon contents—Inductively coupled plasma mass spectrometry
2024-03-15