显现潜在手印试剂通用技术要求 第1部分:水合茚三酮(NIN)
General technical requirements for reagents of developing latent fingerprints—Part 1:Ninhydrin hydrate(NIN)
2021-10-14
GA/T 721.2-2021
显现潜在手印试剂通用技术要求 第2部分:3,3′,5,5′-四甲基联苯胺(TMB)
General technical requirements for reagents of developing latent fingerprints—Part 2:3,3′,5,5′-Tetramethylbenzidine(TMB)
2021-10-14
GA/T 721.3-2021
显现潜在手印试剂通用技术要求 第3部分:1,8-二氮芴-9-酮(DFO)
General technical requirements for reagents of developing latent fingerprints—Part 3:1,8-Diazafluoren-9-one(DFO)
2021-10-14
GA/T 721.4-2021
显现潜在手印试剂通用技术要求 第4部分:7-苄胺基-4-硝基苯并呋咱(BBD)
General technical requirements for reagents of developing latent fingerprints—Part 4:7-Benzylamino-4-nitrobenz-oxa-1,3-diazole(BBD)