显现潜在手印试剂通用技术要求 第1部分:水合茚三酮(NIN)
General technical requirements for reagents of developing latent fingerprints—Part 1:Ninhydrin hydrate(NIN)
2021-10-14
GA/T 721.5-2021
显现潜在手印试剂通用技术要求 第5部分:1,2-茚二酮(IDO)
General technical requirements for reagents of developing latent fingerprints—Part 5:1,2-Indanedione(IDO)
2021-10-14
GA/T 721.2-2021
显现潜在手印试剂通用技术要求 第2部分:3,3′,5,5′-四甲基联苯胺(TMB)
General technical requirements for reagents of developing latent fingerprints—Part 2:3,3′,5,5′-Tetramethylbenzidine(TMB)
2021-10-14
GA/T 721.3-2021
显现潜在手印试剂通用技术要求 第3部分:1,8-二氮芴-9-酮(DFO)
General technical requirements for reagents of developing latent fingerprints—Part 3:1,8-Diazafluoren-9-one(DFO)