Standard Guide for Depth Profiling in Auger Electron Spectroscopy
俄歇电子能谱深度剖面标准指南
2024-10-01
SJ/T 10458-1993
俄歇电子能谱术语和X射线光电子谱术语的样品处理标准导则
Standard guide for specimen handling in auger electron spectroscopy and X-ray photoelectron spectroscopy
1993-12-17
ASTM E983-19
Standard Guide for Minimizing Unwanted Electron Beam Effects in Auger Electron Spectroscopy
俄歇电子光谱法中最小化不需要的电子束效应的标准指南
2019-04-01
ASTM E995-25
Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
俄歇电子光谱和X射线光电子能谱背景减法技术标准指南
2025-04-01
ASTM E984-12(2020)
Standard Guide for Identifying Chemical Effects and Matrix Effects in Auger Electron Spectroscopy
识别俄歇电子能谱中化学效应和基质效应的标准指南
2020-12-01
GB/T 41064-2021
表面化学分析 深度剖析 用单层和多层薄膜测定X射线光电子能谱、俄歇电子能谱和二次离子质谱中深度剖析溅射速率的方法
Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
2021-12-31
ISO 17109-2022
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
表面化学分析.深度剖面.用单层和多层薄膜在X射线光电子能谱、俄歇电子能谱和二次离子质谱中测定溅射速率的方法