GA/T 721.1-2021
显现潜在手印试剂通用技术要求 第1部分：水合茚三酮(NIN)
General technical requirements for reagents of developing latent fingerprints—Part 1:Ninhydrin hydrate(NIN)
2021-10-14
GA/T 721.5-2021
显现潜在手印试剂通用技术要求 第5部分：1,2-茚二酮(IDO)
General technical requirements for reagents of developing latent fingerprints—Part 5:1,2-Indanedione(IDO)
2021-10-14
GA/T 721.3-2021
显现潜在手印试剂通用技术要求 第3部分：1,8-二氮芴-9-酮(DFO)
General technical requirements for reagents of developing latent fingerprints—Part 3:1,8-Diazafluoren-9-one(DFO)
2021-10-14
GA/T 721.2-2021
显现潜在手印试剂通用技术要求 第2部分：3,3′,5,5′-四甲基联苯胺(TMB)
General technical requirements for reagents of developing latent fingerprints—Part 2:3,3′,5,5′-Tetramethylbenzidine(TMB)
2021-10-14
GA/T 721.4-2021
显现潜在手印试剂通用技术要求 第4部分：7-苄胺基-4-硝基苯并呋咱(BBD)
General technical requirements for reagents of developing latent fingerprints—Part 4:7-Benzylamino-4-nitrobenz-oxa-1,3-diazole(BBD)
2021-10-14
GA/T 1650-2019
法庭科学 碳微粒试剂显现胶带粘面手印技术规范
Forensic sciences—Technical specifications for latent fingerprint development from sticky tape surface by carbonic particle reagent
2019-10-14