BS ISO 20289-2018
Surface chemical analysis. Total reflection X-ray fluorescence analysis of water
表面化学分析 水的全反射X射线荧光分析
2018-03-23
ISO 20289-2025
Surface chemical analysis — Total reflection X-ray fluorescence analysis of water
表面化学分析 - 水的全反射X射线荧光分析
2025-06-02
BS PD ISO/TS 18507-2015
Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
表面化学分析 全反射X射线荧光光谱法在生物和环境分析中的应用
2015-07-31
ISO/TS 18507-2015
Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
表面化学分析 - 全反射X射线荧光光谱在生物和环境分析中的应用
2015-07-22
JIS K 0148-2005
Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析用全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
2005-01-01
BS ISO 14706-2014
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 全反射X射线荧光光谱法测定硅片表面元素污染
2014-07-31
KS D ISO 14706
표면 화학 분석 — 전반사 X-선 형광 분석(TXRF) 분광기에 의한 실리콘 웨이퍼의 표면 원소 불순물 결정
表面化学分析用全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
2025-05-12
GB/T 40110-2021
表面化学分析 全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
2021-05-21
ISO 14706-2014
Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 - 通过全反射X射线荧光（TXRF）光谱测定硅晶片上的表面元素污染
2014-07-25
BS ISO 17331-2004+A1-2010
Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析 硅片工作标准物质表面元素收集的化学方法及其全反射X射线荧光光谱测定
2010-09-30
GB/T 30701-2014
表面化学分析 硅片工作标准样品表面元素的化学收集方法和全反射X射线荧光光谱法（TXRF）测定
Surface chemical analysis―Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
2014-03-27
ISO 17331-2004
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
表面化学分析——硅片工作标准物质表面元素收集的化学方法及其全反射X射线荧光光谱测定
2004-05-18
KS L 5222(2019 Confirm)
시멘트의 형광 X선 분석 방법
通过x射线荧光水泥的化学分析方法
2009-10-30
KS L 5222(2024 Confirm)
시멘트의 형광 X선 분석 방법
通过x射线荧光水泥的化学分析方法
2009-10-30
ISO 17331-2004/Amd 1-2010
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
表面化学分析.硅片工作标准物质表面元素收集及其全反射X射线荧光光谱测定的化学方法.修改件1
2010-07-05
BS ISO 10810-2019
Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
表面化学分析 X射线光电子能谱 分析指南
2019-08-23
GB/T 30704-2014
表面化学分析 X射线光电子能谱 分析指南
Surface chemical analysis—X-ray photoelectron spectroscopy—Guidelines for analysis
2014-03-27
ISO 10810-2019
Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
表面化学分析 - X射线光电子能谱分析指南
2019-08-22
BS ISO 29581-2-2010
Cement. Test methods-Chemical analysis by X-ray fluorescence
水泥测试方法
2010-05-31
BS EN ISO 21587-2-2007
Chemical analysis of aluminosilicate refractory products (alternative to the X-ray fluorescence method)-Wet chemical analysis
铝硅酸盐耐火制品的化学分析（X射线荧光法的替代方法）
2007-10-31