GB/T 14847-2025 标准详情
GB/T 14847-2025
即将实施
重掺杂衬底上轻掺杂硅外延层厚度的测试 红外反射法
Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method
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国家标准
GB/T 14847-2010
现行
重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法
Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance
T/CSTM 00036-2020
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铈掺杂铝镓酸钆闪烁晶体
Cerium-doped gadolinium aluminum gallium garnet scintillation crystal
T/CSTM 00035-2020
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铈掺杂硅酸钇闪烁晶体
Cerium-doped yttrium oxyorthosilicate scintillation crystal
T/CSTM 00032-2020
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铈掺杂硅酸钇镥闪烁晶体阵列
Array of LYSO:Ce scintillation crystal
国家标准
GB/T 13389-2014
现行
掺硼掺磷掺砷硅单晶电阻率与掺杂剂浓度换算规程
Practice for conversion between resistivity and dopant density for boron-doped, phosphorus-doped, and arsenic-doped silicon
国家标准
GB/T 44655-2024
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非晶软磁合金粉末
Amorphous soft magnetic alloy powder